JPH0575826B2 - - Google Patents

Info

Publication number
JPH0575826B2
JPH0575826B2 JP62308980A JP30898087A JPH0575826B2 JP H0575826 B2 JPH0575826 B2 JP H0575826B2 JP 62308980 A JP62308980 A JP 62308980A JP 30898087 A JP30898087 A JP 30898087A JP H0575826 B2 JPH0575826 B2 JP H0575826B2
Authority
JP
Japan
Prior art keywords
electron
thin film
magnetic field
evaporated
filament
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62308980A
Other languages
English (en)
Japanese (ja)
Other versions
JPH01149955A (ja
Inventor
Hisashi Yamamoto
Keiji Ishibashi
Kazuo Hirata
Masahiko Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP30898087A priority Critical patent/JPH01149955A/ja
Publication of JPH01149955A publication Critical patent/JPH01149955A/ja
Publication of JPH0575826B2 publication Critical patent/JPH0575826B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP30898087A 1987-12-07 1987-12-07 薄膜製造装置 Granted JPH01149955A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP30898087A JPH01149955A (ja) 1987-12-07 1987-12-07 薄膜製造装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP30898087A JPH01149955A (ja) 1987-12-07 1987-12-07 薄膜製造装置

Publications (2)

Publication Number Publication Date
JPH01149955A JPH01149955A (ja) 1989-06-13
JPH0575826B2 true JPH0575826B2 (en]) 1993-10-21

Family

ID=17987515

Family Applications (1)

Application Number Title Priority Date Filing Date
JP30898087A Granted JPH01149955A (ja) 1987-12-07 1987-12-07 薄膜製造装置

Country Status (1)

Country Link
JP (1) JPH01149955A (en])

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0762240B2 (ja) * 1989-08-02 1995-07-05 日電アネルバ株式会社 電子ビーム蒸着用電子銃
JP4777947B2 (ja) * 2007-08-06 2011-09-21 株式会社ワイ・ジー・ケー 仕掛け用ハリスとこれを用いた釣り用仕掛け

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60181366U (ja) * 1984-05-09 1985-12-02 日本電子株式会社 複数の電子ビ−ムにより材料を加熱する装置

Also Published As

Publication number Publication date
JPH01149955A (ja) 1989-06-13

Similar Documents

Publication Publication Date Title
US4929321A (en) Method and apparatus for coating workpieces
KR20180049057A (ko) 진공처리장치 및 진공처리기판 제조방법
KR20000053411A (ko) 진공아크 증발원 및 진공아크 증착장치
US5418348A (en) Electron beam source assembly
KR20130029092A (ko) 성막 속도가 빠른 아크식 증발원, 이 아크식 증발원을 사용한 피막의 제조 방법 및 성막 장치
JPH0575826B2 (en])
US3202794A (en) Permanent magnet transverse electron beam evaporation source
US3695217A (en) Vapor deposition apparatus
EP0600429A1 (en) Magnetron sputtering device and method for thin film coating
US4947404A (en) Magnet structure for electron-beam heated evaporation source
US4048462A (en) Compact rotary evaporation source
KR960005808B1 (ko) 전자비임 증착용 전자총
JP3409874B2 (ja) イオンプレーティング装置
JPH0762240B2 (ja) 電子ビーム蒸着用電子銃
JP3961158B2 (ja) 電子ビーム蒸発装置
US11848179B2 (en) Methods of and apparatus for magnetron sputtering
KR101005204B1 (ko) 대향 타겟식 스퍼터링 장치
JPS62185875A (ja) 気相成膜装置
JPH11335837A (ja) 磁気媒体製造装置
JPS63290265A (ja) 電子銃装置
JPH05339714A (ja) 電子ビーム蒸発方法
JPH05179432A (ja) 薄膜形成装置におけるプラズマビーム偏向方法
JPH04289162A (ja) イオンプレーティング装置
JPH08311646A (ja) イオン蒸着薄膜形成装置
JPH0551948U (ja) 薄膜形成装置

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081021

Year of fee payment: 15

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081021

Year of fee payment: 15